Nitrogen doping of amorphous carbon thin films
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چکیده
منابع مشابه
Nitrogen doping of amorphous carbon thin films
Nitrogenated and hydrogenated amorphous carbon (a-C:H:N) films have been deposited by a plasma beam source using a gas mixture of C2H2 , Ar and N2 . The Ar/C2H2 ratio is kept constant at a ratio of 3, with the nitrogen flow allowed to vary. Nonnitrogenated films, with Ar/C2H2 ratios of 3 and 6 were also deposited and analyzed before attempting to identify the modifications to the microstructura...
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Rights: © 1999 American Physical Society (APS). This is the accepted version of the following article: Kaukonen, M. & Nieminen, Risto M. & Pöykkö, S. & Seitsonen, Ari P. 1999. Nitrogen Doping of Amorphous Carbon Surfaces. Physical Review Letters. Volume 83, Issue 25. 5346-5349. ISSN 0031-9007 (printed). DOI: 10.1103/physrevlett.83.5346, which has been published in final form at http://journals....
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 1998
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.368268